发明名称 走査イオン顕微鏡および二次粒子制御方法
摘要 The present invention is provided to enable a detailed inspection of a specimen and preventing a distortion of an observation image even when a specimen containing an insulating material is partially charged. For a scanning ion microscope utilizing a gas field ionization ion source, a thin film is disposed between an ion optical system and a specimen, and an ion beam is applied to and transmitted through this thin film in order to focus a neutralized beam on the specimen. Furthermore, an electrode for regulating secondary electrons discharged from this thin film is provided in order to eliminate mixing of noises into an observation image.
申请公布号 JP5896708(B2) 申请公布日期 2016.03.30
申请号 JP20110266616 申请日期 2011.12.06
申请人 株式会社日立ハイテクノロジーズ 发明人 川浪 義実;小瀬 洋一
分类号 H01J37/28;H01J27/26;H01J37/20 主分类号 H01J37/28
代理机构 代理人
主权项
地址
您可能感兴趣的专利