| 摘要 |
The present invention relates to a chemical vapor deposition apparatus comprising: a deposition chamber; a substrate seat unit which a substrate is mounted in, and is installed inside the deposition chamber; an initiator supply unit which is prepared on the outside of the deposition chamber, and supplies a liquid initiator; a monomer supply unit which is placed on the outside of the deposition chamber, and provides a liquid monomer; a liquid droplet producing unit comprising a piezoelectric substance to produce a mixed liquid droplet by applying vibration to mixed liquid in which the liquid monomer is mixed with the liquid initiator which is provided by the initiator supply unit and the monomer supply unit; a spraying unit configured to spray the mixed liquid droplet produced by the liquid droplet producing unit on an upper portion of the substrate. The purpose of the present invention is to provide the chemical vapor deposition apparatus and a chemical vapor deposition method to reduce a manufacturing tack time by decreasing a time for the vapor deposition of the substrate as a spraying amount of the initiator and the monomer increases. |
