发明名称 SILICON IMPLANTATION IN SUBSTRATES AND PROVISION OF SILICON PRECURSOR COMPOSITIONS THEREFOR
摘要 Compositions, systems, and methods are described for implanting silicon and/or silicon ions in a substrate, involving generation of silicon and/or silicon ions from corresponding silicon precursor compositions, and implantation of the silicon and/or silicon ions in the substrate.
申请公布号 SG11201601015R(A) 申请公布日期 2016.03.30
申请号 SG11201601015R 申请日期 2014.08.14
申请人 ENTEGRIS, INC. 发明人 TANG, YING;SWEENEY, JOSEPH, D.;CHEN, TIANNIU;MAYER, JAMES, J.;RAY, RICHARD, S.;BYL, OLEG;YEDAVE, SHARAD, N.;KAIM, ROBERT
分类号 H01L21/265 主分类号 H01L21/265
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