APPARATUS FOR LITHOGRAPHY AND MASK ALIGNER

摘要

The present invention relates to an exposure apparatus and a mask aligner. More specifically, the purpose of the present invention is to provide an exposure apparatus which is small and low-priced, and a mask aligner. The exposure apparatus of the present invention comprises: a stage for supporting a substrate; a mask supporting part supporting the mask which has an exposure pattern; and a light source part comprising a light source which generates light for exposing the substrate, and directly coupled to the mask supporting part.