| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a particle aligning device which aligns particles of an optional material whose magnitudes are several ten nm to several ten μm in an optional place, in an optional shape and in a short time, and a particle aligning method. <P>SOLUTION: The particle aligning device 20 comprises: a plasma generation device 10 for generating plasma 3; a particle injection part 16 for injecting the particles 6 into a region in which the plasma is generated; a substrate holding part which holds the substrate for aligning the particles in a position facing the plasma in a plasma generation device; and a pattern 14 which is arranged on the substrate 12 and has an opening with a point in which the particles are aligned on the substrate as a center. After the particles are injected into the region in which the plasma is generated, the plasma in the plasma generation device is distinguished and the particles are aligned on the substrate so as to correspond to the pattern. <P>COPYRIGHT: (C)2013,JPO&INPIT |
