| 摘要 |
<P>PROBLEM TO BE SOLVED: To mold a surface microstructure improved in low reflection characteristics. <P>SOLUTION: As a substrate material for an original plate, a lithium niobate monocrystal substrate 41 is used. On a surface of the substrate 41, a metal membrane 42 of Cr or the like is formed as a dry etching mask, a resin micropattern 44 is generated thereon, and this is used as a mask to perform etching, thereby obtaining a metal micropattern 45. By etching the lithium niobate monocrystal substrate 41 while shrinking the metal micropattern 45 using the metal micropattern 45 as a mask, a structure is generated in which almost no flat surface is present within a microstructure. <P>COPYRIGHT: (C)2013,JPO&INPIT |
