| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask blank manufacturing method in which a deterioration in flatness is suppressed, and a transfer mask manufacturing method. <P>SOLUTION: A mask blank manufacturing method includes the steps of: preparing a glass substrate in which mirror polishing is performed on a main surface thereof; performing optical heating processing for irradiating the prepared glass substrate with the light including wavelengths in the infrared range; and forming a thin film composed of material containing tantalum and substantially not containing hydrogen on the main surface of the glass substrate after the optical heating processing. <P>COPYRIGHT: (C)2013,JPO&INPIT |
