| 摘要 |
PURPOSE: A pattern formation method and a pattern forming device are provided to shorten a time from import of support element to patterning. CONSTITUTION: A pattern formation method comprises steps of: importing a plate to a patterning means; importing a support element dipping a coating layer to the pattering means imported with the plate; and forming a pattern layer on the support element by patterning the coating layer of the support element with the plate imported to the patterning means. A pattern forming device comprises: a patterning means forming a pattern layer on the support element by patterning a coating layer dipped by the support element with a plate; a plate import means importing the plate to the patterning means; and a support element import means importing the support element dipping the coating layer to the pattering means imported with the plate. [Reference numerals] (AA) Plate PP; (BB) Blanket BL; (CC) Substrate SB; (DD) Patterning →exfoliating plate; (EE) Transcribing → exfoliating substrate; (S11) Peeling the substrate off from the upper stage unit; (S3) Carrying the plate from the upper stage unit; (S4) Carrying the blanket from the lower stage unit; (S7) Peeling the substrate from the upper stage unit; (S8) Carrying the substrate from the upper stage unit |
