Multi charged particle beam writing apparatus

摘要

A multi charged particle beam writing apparatus includes an aperture member to form multiple beams, a blanking plate in which there are arranged a plurality of blankers to respectively perform blanking deflection for a corresponding beam in the multiple beams having passed through a plurality of openings of the aperture member, a blanking aperture member to block each beam having been deflected to be in OFF state by at least one of the plurality of blankers, a first grating lens, using the aperture member as gratings, to correct spherical aberration of the charged particle beam, and a correction lens configured to correct high order spherical aberration produced by the first grating lens.

主权项

1. A multi charged particle beam writing apparatus comprising:
a stage configured to mount a target object thereon and to be continuously movable; an emission unit configured to emit a charged particle beam; an aperture member, in which a plurality of openings are formed, configured to form multiple beams by letting a region including a whole of the plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of the plurality of openings; a blanking plate in which there are arranged a plurality of blankers configured to respectively perform blanking deflection for a corresponding beam in the multiple beams having passed through the plurality of openings of the aperture member; a blanking aperture member configured to block each beam having been deflected to be in OFF state by at least one of the plurality of blankers; a first grating lens, using the aperture member as gratings, configured to correct spherical aberration of the charged particle beam; and a correction lens configured to correct high order spherical aberration produced by the first grating lens.