Extreme ultraviolet light generation apparatus

摘要

An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.

主权项

1. An apparatus for generating extreme ultraviolet light, comprising:
a chamber having an opening through which a laser beam is introduced into the chamber; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; a collector mirror for collecting the extreme ultraviolet light emitted from the plasma; and a reference member having a first surface and a second surface opposite to the first surface, the chamber and the collector mirror being disposed on the first surface, the laser beam focusing optical system being disposed on the second surface, the reference member positioning the chamber, the collector mirror, and the laser beam focusing optical system.