| 摘要 |
The present invention relates to a substrate inspection apparatus comprising: a first stage moving horizontally a loaded substrate in an aligned state, and moved autonomously in a horizontal direction at the same time; a second stage continuously moving horizontally the substrate received from the first stage, and autonomously moved horizontally; and a cameral arranged between the first stage and the second stage, and photographing the substrate being moved horizontally. The technical subject of the present invention is to provide the substrate inspection apparatus having a high speed to inspect a substrate, and having excellent location precision; thereby maximizing inspection efficiency. |
