发明名称 |
Method for designing topographic patterns for directing the formation of self-assembled domains at specified locations on substrates |
摘要 |
Methods and computer program products for designing topographic patterns for directing the formation of self-assembled domains at specified locations on substrates. The methods include generating mathematical models that operate on mathematical descriptions of the number and locations of cylindrical self-assembled domains in a mathematical description of a guiding pattern. |
申请公布号 |
US9298870(B1) |
申请公布日期 |
2016.03.29 |
申请号 |
US201213472598 |
申请日期 |
2012.05.16 |
申请人 |
International Business Machines Corporation |
发明人 |
Cheng Joy;Lai Kafai;Liu Chi-Chun;Pitera Jed W.;Rettner Charles T. |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
Schmeiser, Olsen & Watts |
代理人 |
Schmeiser, Olsen & Watts |
主权项 |
1. A method of designing a guiding pattern opening in a layer on a substrate, the guiding pattern opening yielding a set of self-assembled domains at specified locations within the guiding pattern opening when the guided pattern opening is filled with a self-assembly material that undergoes directed self-assembly, the method comprising:
(a) specifying a number and corresponding locations of self-assembled domains; (b) generating a mathematical description of an initial guiding pattern opening based on said specified number and locations of self-assembled domains and designating said initial guiding pattern opening as a current guiding pattern opening; (c) using a computer, computing a mathematical model to generate calculated numbers and calculated high-probability locations of self-assembled domains within said current guiding pattern opening, wherein said function represents the relative probability that said self-assembled domains will form at said specified locations within said current guiding pattern opening; (d) comparing the calculated number of high-probability locations of said mathematical model with said specified number of self-assembled domains and comparing the calculated locations of said high-probability locations with said specified locations of self-assembled domains; (e) adjusting the current guiding pattern opening based on said comparing of step (d); and (f) repeating steps (c) to (e) until both (i) said calculated number of self-assembled domains and said specified number of self-assembled domains is the same and (ii) said high-probability locations of self-assembled domains and said specified locations of self-assembled domains agree within a specified range. |
地址 |
Armonk NY US |