发明名称 Metal dewetting methods and articles produced thereby
摘要 Described herein are improved dewetting methods and improved patterned articles produced using such methods. The improved methods and articles generally implement continuous ultra-thin metal-containing films or film stacks as the materials to be dewetted. For example, a method can involve the steps of providing a substrate that has a continuous ultra-thin metal-containing film or film stack disposed on a surface thereof, and dewetting at least a portion of the continuous ultra-thin metal-containing film or film stack to produce a plurality of discrete metal-containing dewetted islands on the surface of the substrate.
申请公布号 US9296183(B2) 申请公布日期 2016.03.29
申请号 US201213687208 申请日期 2012.11.28
申请人 Corning Incorporated 发明人 Baker David Eugene;Carbonell Carme Gomez;Dawson-Elli David Francis;Mazumder Prantik;Pruneri Valerio;Tian Lili
分类号 B32B3/10;B32B33/00;B05D3/02;C23C14/18;C23C14/58 主分类号 B32B3/10
代理机构 代理人 Patel Payal A.
主权项 1. A patterned article, comprising: a substrate; a continuous ultra-thin metal-containing film or film stack disposed on a surface of the substrate; and a plurality of discrete dewetted metal-containing islands disposed on a surface of the continuous ultra-thin metal-containing film or film stack; wherein the plurality of discrete metal-containing dewetted islands have an average height of about 5 nanometers to about 300 nanometers, an average longest lateral cross-sectional dimension of about 10 nanometers to about 1000 nanometers, and are randomly oriented on the surface of the continuous ultra-thin metal-containing film or film stack so as to cover less than or equal to about 0.5 of an area fraction of the surface of the continuous ultra-thin metal-containing film or film stack.
地址 Corning NY US