发明名称 COMPOSITION FOR SURFACE MODIFICATION OF INSULATOR, METHOD FOR SURFACE MODIFICATION OF INSULATOR, INSULATOR, AND THIN FILM TRANSISTOR
摘要 The present invention relates to a composition for surface modification of an insulator, which comprises a compound including a structure unit represented by chemical formula 1 and a structure unit represented by chemical formula 2 at least at one end; a surface modification method of an insulator; a surface modified insulator; and an electronic device comprising the insulator. In chemical formula 1 and 2, the definition of R^a, R^b, R^c, L^1, n, m, and k are the same as defined in the specification.
申请公布号 KR20160033262(A) 申请公布日期 2016.03.28
申请号 KR20140123031 申请日期 2014.09.16
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JUNG, JI YOUNG;LEE, EUN KYUNG;CHOI, A JEONG
分类号 C08J7/16;H01L29/786 主分类号 C08J7/16
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