发明名称 |
COMPOSITION FOR SURFACE MODIFICATION OF INSULATOR, METHOD FOR SURFACE MODIFICATION OF INSULATOR, INSULATOR, AND THIN FILM TRANSISTOR |
摘要 |
The present invention relates to a composition for surface modification of an insulator, which comprises a compound including a structure unit represented by chemical formula 1 and a structure unit represented by chemical formula 2 at least at one end; a surface modification method of an insulator; a surface modified insulator; and an electronic device comprising the insulator. In chemical formula 1 and 2, the definition of R^a, R^b, R^c, L^1, n, m, and k are the same as defined in the specification. |
申请公布号 |
KR20160033262(A) |
申请公布日期 |
2016.03.28 |
申请号 |
KR20140123031 |
申请日期 |
2014.09.16 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JUNG, JI YOUNG;LEE, EUN KYUNG;CHOI, A JEONG |
分类号 |
C08J7/16;H01L29/786 |
主分类号 |
C08J7/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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