| 摘要 |
Generation of liquid splashing is suppressed while the generation of a processing residue is suppressed. A substrate processing apparatus comprises a rotation maintaining part, a first nozzle for spraying a processing liquid in order for branch streams of a droplet to be roughly in a vertical direction, a second nozzle for discharging a continuous stream of the processing liquid, and a nozzle movement part for integrally moving the first nozzle and the second nozzle. When the first nozzle is located on an upper side of an edge part of a substrate, a droplet arrival position of the continuous stream is located on a rotation center side rather than an arrival position of the branch stream of the droplet. In addition, a movement route of both the liquid arrival position of the branch stream of the droplet and the liquid arrival position of the continuous stream is different from at least one of both flowing directions of the continuous stream and the branch stream of the droplet. Difference of the movement route of both sides is caused by which the liquid arrival position of the continuous stream is located on a lower side of a rotation direction rather than the movement route of the liquid arrival position of the branch stream of the droplet, when the first nozzle is located on the upper side of the edge part of the substrate. Moreover, the difference between the flowing directions of both sides is caused by which the continuous stream is inclined as to the vertical direction. |
