| 摘要 |
The present invention relates to an apparatus for decomposing a hydrogen peroxide, which can significantly reduce the content of the hydrogen peroxide by decomposing the hydrogen peroxide into water and oxygen in order to analyze a small amount of impurities included in the hydrogen peroxide used in a semiconductor manufacturing process, and to an analysis system using the same. The apparatus for decomposing a hydrogen peroxide according to the present invention includes: a pipe type column which has an injection hole to introduce the hydrogen peroxide at one end, and has a discharge hole to discharge the decomposed hydrogen peroxide at the other end; more than one platinum wire which is extended along an axis of the column inside the column, and decomposes the hydrogen peroxide into water and oxygen by reacting with the hydrogen peroxide injected into the column; and a cooling pipe which is installed to surround an outer circumference of the column, and is connected to a cooling fluid supply source to have a coolant inlet hole for introducing a cooling fluid and a coolant outlet hole for discharging the cooling fluid heat-exchanged with the outer circumference of the column. |
