| 摘要 |
The present invention relates to a substrate treatment system. More specifically, the purpose of the present invention is to provide a substrate treating apparatus which can enhance endpoint detection efficiency. According to an embodiment of the present invention, the substrate treatment system comprises a processing chamber carrying out processes using plasma; and a detection unit detecting an endpoint by performing optical analysis on the plasma in the processing chamber. In addition, the detection unit may includes: a photosensor; a first controller collecting spectrum data from the photosensor; and a second controller analyzing some of the data received from the first controller by automatically selecting the same. |
