COMPONENT FOR PLASMA PROCESSING APPARATUS, AND MANUFACTURING METHOD THEREFOR

摘要

According to the present invention, the generation of particles from a thermal spray film of yttrium fluoride is prevented. Provided is a component which is exposed to plasma in a plasma processing apparatus. The component has a substrate and a film. The substrate, for example, is made of Al or Al alloy. An alumite layer may be formed on the surface of the substrate. The film is formed by spraying yttrium fluoride onto the substrate or a lower surface including a layer prepared on the substrate. The porosity in the film of the component is 4% or less. The arithmetical mean illuminance (Ra) of the surface of a corresponding film is 4.5 μm or less.