STRIPPER COMPOSITION FOR REMOVING PHOTORESIST AND STRIPPING METHOD OF PHOTORESIST USING THE SAME

摘要

The present invention relates to a stripper composition for removing photoresist and a method for stripping the photoresist using the same. More specifically, the purpose of the present invention is to provide a stripper composition for removing photoresist, which exhibits superior stripping and rinsing strength under an aqueous or a non-aqueous condition for the photoresist. According to the present invention, the stripper composition of the present invention comprises: at least one sort of amine compounds; at least one sort of solvents selected among the group comprising a polar aprotic organic solvent and water; a polar protic organic solvent; polyether-modified polydimethylsiloxane having the dynamic viscosity of 25-250 mPa·s at 20°C and containing 20-70 mole% of a polydimethylsiloxane repeat unit having a polyether-based functional group.