发明名称 CLEANSING COMPOSITION FOR METAL FILM
摘要 The present invention relates to a cleaner composition for a metal film and, more specifically, to a cleaner composition for a metal film which removes impurities and residue left on a substrate during a flat panel display manufacturing process. The cleaner composition for a metal film comprises: at least one hydroxide selected from alkali metal hydroxide and alkyl ammonium hydroxide; a polar solvent capable of dissolving the hydroxide for at least one part by weight per 100 parts by weight; and a corrosion inhibitor.
申请公布号 KR20160032839(A) 申请公布日期 2016.03.25
申请号 KR20140123410 申请日期 2014.09.17
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 CHOI, HAN YOUNG;KIM, WOO IL;BAEK, JONG WOOK;HONG, HUN PYO
分类号 C23G1/14 主分类号 C23G1/14
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