The present invention relates to a cleaner composition for a metal film and, more specifically, to a cleaner composition for a metal film which removes impurities and residue left on a substrate during a flat panel display manufacturing process. The cleaner composition for a metal film comprises: at least one hydroxide selected from alkali metal hydroxide and alkyl ammonium hydroxide; a polar solvent capable of dissolving the hydroxide for at least one part by weight per 100 parts by weight; and a corrosion inhibitor.
申请公布号
KR20160032839(A)
申请公布日期
2016.03.25
申请号
KR20140123410
申请日期
2014.09.17
申请人
DONGWOO FINE-CHEM CO., LTD.
发明人
CHOI, HAN YOUNG;KIM, WOO IL;BAEK, JONG WOOK;HONG, HUN PYO