| 发明名称 |
PHOTORESISTS COMPRISING MULTIPLE ACID GENERATOR COMPOUNDS |
| 摘要 |
The present invention relates to a novel photoresist composition which comprises: a polymer (a) including an acid generator bonded thereon; and an acid generator compound (b) including at least one acid labile group while not being coupled to the polymer. Also, provided is a method for forming a relief image of the photoresist composition of the present invention. |
| 申请公布号 |
KR20160033090(A) |
申请公布日期 |
2016.03.25 |
| 申请号 |
KR20160027592 |
申请日期 |
2016.03.08 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
THACKERAY JAMES W.;SUNG, JIN WUK;LABEAUME PAUL J.;JAIN VIPUL |
| 分类号 |
G03F7/039;G03F7/00;G03F7/004;G03F7/20;H01L21/027 |
主分类号 |
G03F7/039 |
| 代理机构 |
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