发明名称 INFRARED IMAGE SENSOR
摘要 An infrared image sensor includes a bias circuit receiving a timing signal, the bias circuit generating a bias voltage having a first value and a second value in response to the timing signal; a semiconductor light-receiving device including a photodiode, the semiconductor light-receiving device receiving the bias voltage; a read-out circuit including a read-out electrode connected to the photodiode, the read-out electrode receiving electrical signal from the photodiode; and a signal processing circuit processing a read-out signal from the read-out circuit synchronously with the timing signal. The photodiode includes an optical absorption layer made of a III-V group compound semiconductor. The optical absorption layer has a type II multi quantum well structure including first compound semiconductor layers containing antimony as a constituent element and second compound semiconductor layers that are stacked alternately.
申请公布号 US2016087000(A1) 申请公布日期 2016.03.24
申请号 US201514855016 申请日期 2015.09.15
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 INADA Hiroshi;BALASEKARAN Sundararajan
分类号 H01L27/146;H01L31/0352;H01L31/0304 主分类号 H01L27/146
代理机构 代理人
主权项 1. An infrared image sensor comprising: a bias circuit receiving a timing signal, the bias circuit generating a bias voltage having a first value and a second value in response to the timing signal; a semiconductor light-receiving device including a photodiode, the semiconductor light-receiving device receiving the bias voltage; a read-out circuit including a read-out electrode connected to the photodiode, the read-out electrode receiving electrical signal from the photodiode; and a signal processing circuit processing a read-out signal from the read-out circuit synchronously with the timing signal, wherein the photodiode includes an optical absorption layer made of a III-V group compound semiconductor; and the optical absorption layer has a type II multi quantum well structure including first compound semiconductor layers containing antimony as a constituent element and second compound semiconductor layers that are stacked alternately.
地址 Osaka JP