发明名称 PROXIMITY CONTACT COVER RING FOR PLASMA DICING
摘要 Methods of and carriers for dicing semiconductor wafers, each wafer having a plurality of integrated circuits, are described. In an example, a cover ring for protecting a carrier and substrate assembly during an etch process includes an inner opening having a diameter smaller than the diameter of a substrate of the carrier and substrate assembly. An outer frame surrounds the inner opening. The outer frame has a bevel for accommodating an outermost portion of the substrate of the carrier and substrate assembly.
申请公布号 WO2016043938(A1) 申请公布日期 2016.03.24
申请号 WO2015US47038 申请日期 2015.08.26
申请人 APPLIED MATERIALS, INC. 发明人 HOLDEN, JAMES M.;LERNER, ALEXANDER N.;KUMAR, AJAY;IYER, APARNA;OUYE, ALAN HIROSHI
分类号 H01L21/301;H01L21/3065;H01L21/78 主分类号 H01L21/301
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