| 摘要 |
PROBLEM TO BE SOLVED: To accurately control a vaporization flow rate of a raw material included in a raw material gas when supplying the raw material gas including a gas produced by vaporizing the solid or liquid raw material to a film deposition processing part.SOLUTION: A carrier gas is supplied to a raw material container 3 which contains a raw material, and a raw material gas including a vaporized raw material is continuously supplied to a film deposition processing part 2 for the raw material together with a diluent gas. A flow rate M1 of the raw material gas is measured by a mass flowmeter 7, and an integral value obtained by integrating a flow rate measurement value C1 of the carrier gas flowing through the mass flowmeter 7 with a supply period of the raw material gas is subtracted from an integral value obtained by integrating the flow rate measured value with the supply period so as to find a vaporization amount A of the raw material. A deviation of the acquired vaporization amount A from a set value of the vaporization amount A of the raw material is found, and the deviation is added as a correction value to a flow rate set value C1 of the carrier gas so as to maintain the vaporization amount A of the raw material at the set value. The deviation is subtracted from a flow rate set value C2 of the diluent gas so as to make the total flow rate of the carrier gas and diluent gas constant.SELECTED DRAWING: Figure 2 |
