| 发明名称 |
IMPROVED STEREOLITHOGRAPHY SYSTEM |
| 摘要 |
A stereolithography system comprises a first emitting device, a second emitting device, and a tank disposed between the first emitting device and the second emitting device. The stereolithography system may further include a drip feeder in fluid communication with the tank. The first emitting device, the second emitting device, and the tank may be aligned either horizontally or vertically. |
| 申请公布号 |
US2016082655(A1) |
申请公布日期 |
2016.03.24 |
| 申请号 |
US201414888931 |
申请日期 |
2014.05.05 |
| 申请人 |
CASTANON Diego;SNIDER Jeff |
发明人 |
Castanon Diego;Snider Jeff |
| 分类号 |
B29C67/00;B29C35/08 |
主分类号 |
B29C67/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A stereolithography system comprising:
a first emitting device; a second emitting device; a tank disposed between the first emitting device and the second emitting device, the tank including a first moveable partition and a second moveable partition which define a central chamber of the tank; and a drip feeder in fluid communication with and providing resin to the central chamber of the tank. |
| 地址 |
North Vancouver CA |
