| 摘要 |
This block copolymer comprises a block of a repeating unit represented by one of general formulae (I-1)-(I-3) and a block of a repeating unit represented by general formula (II). (In the formulae, R1 represents an alkyl group, a cycloalkyl group, an aryl group or the like; R2 represents an alkyl group or the like; each of R3 and R4 represents an alkyl group or the like; R5 represents a hydrogen atom, an alkyl group or the like; and R6 represents an alkyl group or cycloalkyl group which has at least two or more hydroxyl groups, a carboxyl group or the like.) A fine pattern that is formed by self-assembling lithography using a graphoepitaxy method with use of a block copolymer of the present invention has a high-definition high-quality lamellar shape in comparison to fine patterns that are formed by a similar technique using PS-b-PMMA or the like as the block copolymer. |
