| 摘要 |
PROBLEM TO BE SOLVED: To switch a gas to be used to process an object to be processed in a short time and to control a distribution of gas nearby the object to be processed.SOLUTION: A processing apparatus comprises: a plurality of gas supply paths which supply a plurality of gases to be used to process an object to be processed into a processing container; a second gas supply path which supplies a gas to be used to process the object to be processed into the processing container; a plurality of first valves V57, V47 which open and close the plurality of first gas supply paths; a second valve V77 which opens and closes the second gas supply path; and a control part which controls opening/closing operations of the first valves V57, V47 and the second valve V77. The control part controls the opening/closing operations of the first valves V57, V47 so that open periods do not overlap each other, and controls the opening/closing operation of the second valve V77 so that an open period of the second valve V77 overlaps the open period of the one first valve V47 with predetermined temporal relation.SELECTED DRAWING: Figure 7 |
