| 摘要 |
PROBLEM TO BE SOLVED: To provide such technology that a good resist pattern can be formed while maintaining high flexibility in designing a mask blank.SOLUTION: A mask blank 1 with a resist film includes a substrate 10 having a thin film 11, and a negative resist film 12 formed on the major surface of the thin film 11. In the resist film 12, a photoacid generator high concentration region 12a is formed in a portion where the resist film 12 is in contact with the thin film 11, the photoacid generator high concentration region 12a having a higher concentration of a photoacid generator than in other region of the resist film 12.SELECTED DRAWING: Figure 1 |
