| 发明名称 |
VERTICAL NO-SPIN PROCESS CHAMBER |
| 摘要 |
A processing chamber includes a base, a cover, and grippers. The base includes a body, a mating surface, an inner zone cavity extending into the body, a divider substantially surrounding the inner zone cavity, and an outer zone cavity extending into the body and substantially surrounding the divider. The cover includes a mating surface that contacts the body mating surface when the processing chamber is closed. The grippers hold the wafer in the inner zone cavity when the processing chamber is closed. |
| 申请公布号 |
US2016086811(A1) |
申请公布日期 |
2016.03.24 |
| 申请号 |
US201514957154 |
申请日期 |
2015.12.02 |
| 申请人 |
BEIJING SEVENSTAR ELECTRONICS CO., LTD. |
发明人 |
Mackedanz Bruce;Henry Sally-Ann;Burkman Don C.;Peterson Charlie A.;Ley Cary M. |
| 分类号 |
H01L21/306;H01L21/02 |
主分类号 |
H01L21/306 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of processing a wafer, the method comprising:
loading the wafer into an inner zone of a processing chamber, the wafer being locked in a stationary position; immersing the wafer in a processing chemical by flowing the processing chemical into the inner zone while the wafer remains stationary; flowing the processing chemical into an outer zone of the processing chamber that substantially surrounds the inner zone; and exiting the processing chemical from the processing chamber. |
| 地址 |
Beijing CN |
