发明名称 GATE CONTROL DEVICE, SEMICONDUCTOR DEVICE, AND METHOD FOR CONTROLLING SEMICONDUCTOR DEVICE
摘要 A semiconductor device according to an embodiments controls a gate voltage to be applied to a gate electrode of a junction field effect transistor including a source electrode, a drain electrode, and the gate electrode, the transistor having a first threshold voltage at which the transistor is turned on, and a second threshold at which conductivity modulation occurs in the transistor so as to make the gate voltage equal to or higher than the second threshold voltage when a forward current in a direction from the drain electrode toward the source electrode flows, and so as to make the time variation in gate voltage have a point from which the rate of the time variation starts decreasing at a voltage between the second threshold voltage and the first threshold voltage when the forward current to be shut down.
申请公布号 US2016087625(A1) 申请公布日期 2016.03.24
申请号 US201514824228 申请日期 2015.08.12
申请人 Kabushiki Kaisha Toshiba 发明人 IKEDA Kentaro;KURAGUCHI Masahiko
分类号 H03K17/687;H01L29/20;H01L29/778 主分类号 H03K17/687
代理机构 代理人
主权项 1. A gate control device configured to control a gate voltage to be applied to a gate electrode of a junction field effect transistor including a source electrode, a drain electrode, and the gate electrode, the transistor having a first threshold voltage at which the transistor is turned on, and a second threshold voltage at which conductivity modulation occurs in the transistor so as to make the gate voltage equal to or higher than the second threshold voltage when a forward current in a direction from the drain electrode toward the source electrode flows, and so as to make a time variation in the gate voltage have a point from which a rate of the time variation starts decreasing at a voltage between the second threshold voltage and the first threshold voltage when the forward current to be shut down.
地址 Minato-ku JP