发明名称 METHOD OF MANUFACTURING A MEMS MICROPHONE
摘要 A method of fabricating a micro electrical-mechanical system (MEMS) microphone on a substrate includes forming a sacrificial layer on a front surface of the substrate, forming a membrane within the sacrificial layer, forming a fixed plate on the sacrificial layer at a location corresponding to a location of the membrane, performing a laser cutting on the back surface of the substrate at a location corresponding to an edge region of the fixed plate until a surface of the sacrificial layer is expose to form an opening, forming a patterned photoresist layer on the back surface exposing a region within the boundary of the opening, removing a portion of the back surface using the patterned photoresist layer as a mask to form a cavity, and removing a portion of the sacrificial layer above and below the membrane to form an air gap between the membrane and the fixed plate.
申请公布号 US2016088414(A1) 申请公布日期 2016.03.24
申请号 US201514849582 申请日期 2015.09.09
申请人 SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION 发明人 ZHENG CHAO;LI WEIGANG
分类号 H04R31/00;H04R19/00;H04R19/04;B81C1/00 主分类号 H04R31/00
代理机构 代理人
主权项 1. A method of manufacturing a micro electromechanical system (MEMS) microphone, the method comprising: providing a semiconductor substrate having a front surface and a back surface; forming a sacrificial layer on the front surface of the semiconductor substrate; forming a membrane within the sacrificial layer; forming a fixed plate on the sacrificial layer at a location corresponding to a location of the membrane; performing a laser cutting on the back surface of the semiconductor substrate at a location corresponding to an edge region of the fixed plate until a surface of the sacrificial layer is exposed to form an opening; forming a patterned photoresist layer on the back surface of the semiconductor substrate exposing a region within a boundary of the opening, removing a portion of the back surface of the semiconductor substrate using the patterned photoresist layer as a mask until the surface of the sacrificial layer is exposed to form a cavity; and removing a portion of the sacrificial layer disposed above and below a center region of the membrane to form an air gap between the membrane and the fixed plate.
地址 Shanghai CN