POLISHING PAD, POLISHING APPARATUS AND METHOD FOR MANUFACTURING POLISHING PAD

摘要

The present invention relates to a polishing pad comprising a base sheet containing a restriction layer. The invention also relates to a polishing apparatus and a method for manufacturing a polishing pad.

主权项

1. A polishing pad comprising a polishing sheet and a base sheet, wherein the base sheet comprises:
a restriction layer comprising a plurality of first oriented fibers and a plurality of second oriented fibers, wherein all the first oriented fibers are arranged toward a first direction; all the second oriented fibers are arranged toward a second direction; and the first direction intersects with the second direction to define a space; and a first polymeric elastomer filling in the space defined by the first direction and the second direction.