| 发明名称 |
INTEGRATED PHOTODETECTOR WAVEGUIDE STRUCTURE WITH ALIGNMENT TOLERANCE |
| 摘要 |
An encapsulated integrated photodetector waveguide structures with alignment tolerance and methods of manufacture are disclosed. The method includes forming a waveguide structure bounded by one or more shallow trench isolation (STI) structure(s). The method further includes forming a photodetector fully landed on the waveguide structure. |
| 申请公布号 |
US2016085039(A1) |
申请公布日期 |
2016.03.24 |
| 申请号 |
US201514963520 |
申请日期 |
2015.12.09 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
Assefa Solomon;Porth Bruce W.;Shank Steven M. |
| 分类号 |
G02B6/42;H01L31/18 |
主分类号 |
G02B6/42 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method comprising:
forming a waveguide structure bounded by one or more shallow trench isolation (STI) structure(s); and forming a photodetector fully landed on the waveguide structure. |
| 地址 |
Armonk NY US |
