MATERIALS, COMPONENTS, AND METHODS FOR USE WITH EXTREME ULTRAVIOLET RADIATION IN LITHOGRAPHY AND OTHER APPLICATIONS

摘要

Nanostructured photonic materials, and associated components for use in devices and systems operating at ultraviolet (UV), extreme ultraviolet (EUV), and/or soft Xray wavelengths are described. Such a material may be fabricated with nanoscale features tailored for a selected wavelength range, such as at particular UV, EUV, or soft Xray wavelengths or wavelength ranges. Such a material may be used to make components such as mirrors, lenses or other optics, panels, lightsources, masks, photoresists, or other components for use in applications such as lithography, wafer patterning, astronomical and space applications, biomedical applications, biotech or other applications.

主权项

1. A method of manufacturing an optical element, the element intended to be reflective or transmissive at a target wavelength in the range from 0.1 to 250 nanometer, comprising:
providing a substrate; assembling a set of nanoscale building blocks into a configuration or scaffold structure having a predefined arrangement; and depositing, using atomic layer deposition, a material into the assembled configuration or scaffold.