发明名称 OPTICAL ALIGNMENT METHOD AND PATTERNED RETARDER MANUFACTURING METHOD USING POLARIZED PULSE UV
摘要 The present invention relates to a method for manufacturing a patterned retarder including an optical alignment layer or a first domain optically aligned in a first direction and a second domain optically aligned in a second direction. According to the invention, it is possible to improve productivity and to maximize optical alignment efficiency by reducing an optical alignment processing time using polarized pulse UV.
申请公布号 US2016085010(A1) 申请公布日期 2016.03.24
申请号 US201314888924 申请日期 2013.11.25
申请人 KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY 发明人 Shin Gyo Jic;Lee Sang Kug;Choi Kyung Ho
分类号 G02B5/30;G02F1/1337;G03F7/00;G02B27/26 主分类号 G02B5/30
代理机构 代理人
主权项 1. An optical alignment method using polarized pulse UV comprising the steps of: (a) preparing a substrate; (b) forming a photoreactive layer by applying a photoreactive agent onto the substrate; and (c) forming an optical alignment layer by irradiating the photoreactive layer by irradiating the photoreactive layer with polarized pulse UV.
地址 89, Chungcheongnam-do KR