发明名称 |
OPTICAL ALIGNMENT METHOD AND PATTERNED RETARDER MANUFACTURING METHOD USING POLARIZED PULSE UV |
摘要 |
The present invention relates to a method for manufacturing a patterned retarder including an optical alignment layer or a first domain optically aligned in a first direction and a second domain optically aligned in a second direction. According to the invention, it is possible to improve productivity and to maximize optical alignment efficiency by reducing an optical alignment processing time using polarized pulse UV. |
申请公布号 |
US2016085010(A1) |
申请公布日期 |
2016.03.24 |
申请号 |
US201314888924 |
申请日期 |
2013.11.25 |
申请人 |
KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY |
发明人 |
Shin Gyo Jic;Lee Sang Kug;Choi Kyung Ho |
分类号 |
G02B5/30;G02F1/1337;G03F7/00;G02B27/26 |
主分类号 |
G02B5/30 |
代理机构 |
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代理人 |
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主权项 |
1. An optical alignment method using polarized pulse UV comprising the steps of:
(a) preparing a substrate; (b) forming a photoreactive layer by applying a photoreactive agent onto the substrate; and (c) forming an optical alignment layer by irradiating the photoreactive layer by irradiating the photoreactive layer with polarized pulse UV. |
地址 |
89, Chungcheongnam-do KR |