发明名称 INTEGRATED ROTATION RATE AND ACCELERATION SENSOR AND METHOD FOR MANUFACTURING AN INTEGRATED ROTATION RATE AND ACCELERATION SENSOR
摘要 A micromechanical device having a main plane of extension includes a sensor wafer, an evaluation wafer, and an intermediate wafer situated between the sensor wafer and the evaluation wafer, the evaluation wafer having at least one application-specific integrated circuit. The sensor wafer and/or the intermediate wafer includes a first sensor element and a second sensor element spatially separated from the first sensor element, the first and second sensor elements being respectively located in a first cavity and a second cavity each formed by the intermediate wafer and the sensor wafer, a first gas pressure in the first cavity differing from a second gas pressure in the second cavity, and the intermediate wafer having an opening at a point in a direction perpendicular to the main plane of extension.
申请公布号 US2016084865(A1) 申请公布日期 2016.03.24
申请号 US201414890527 申请日期 2014.05.05
申请人 ROBERT BOSCH GMBH 发明人 Kaelberer Arnd;Reinmuth Jochen;Classen Johannes
分类号 G01P1/00;G01C19/56;G01P15/02;B81C1/00 主分类号 G01P1/00
代理机构 代理人
主权项
地址 Stuttgart DE