发明名称 |
PRECIOUS METAL-PLATED SWITCH CONTACT ELEMENT AND PREPARATION METHOD THEREFOR |
摘要 |
A precious metal switch contact element prepared by plating resist, plating and etching processes. The plating resist process is implemented by printing a plating resist ink for which an exposure machine is not required. The plating process is implemented by electroplating or chemical plating of a precious metal. The etching process is implemented by using an etching solution containing a weak organic acid, a weak inorganic acid or an acidic buffering agent, the brightness of the etching is increased and measuring etching is avoided by means of a sulphur-containing compound, and the dust resistance performance and the oil resistance performance of a contact are increased by increasing the etching depth. A switch contact prepared by the present processes has advantages such as good electrical conduction reliability, excellent dust resistance and oil resistance, short contact bounce time, a long service life and low raw material costs. |
申请公布号 |
WO2016041244(A1) |
申请公布日期 |
2016.03.24 |
申请号 |
WO2014CN90913 |
申请日期 |
2014.11.12 |
申请人 |
NANTONG MEMTECH TECHNOLOGIES CO., LTD |
发明人 |
HAN, HUISHENG;ZHANG, HONGMEI;DING, YANG;DONG, ZHIHAO;HUANG, CHENG |
分类号 |
H01H11/04 |
主分类号 |
H01H11/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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