发明名称 PRECIOUS METAL-PLATED SWITCH CONTACT ELEMENT AND PREPARATION METHOD THEREFOR
摘要 A precious metal switch contact element prepared by plating resist, plating and etching processes. The plating resist process is implemented by printing a plating resist ink for which an exposure machine is not required. The plating process is implemented by electroplating or chemical plating of a precious metal. The etching process is implemented by using an etching solution containing a weak organic acid, a weak inorganic acid or an acidic buffering agent, the brightness of the etching is increased and measuring etching is avoided by means of a sulphur-containing compound, and the dust resistance performance and the oil resistance performance of a contact are increased by increasing the etching depth. A switch contact prepared by the present processes has advantages such as good electrical conduction reliability, excellent dust resistance and oil resistance, short contact bounce time, a long service life and low raw material costs.
申请公布号 WO2016041244(A1) 申请公布日期 2016.03.24
申请号 WO2014CN90913 申请日期 2014.11.12
申请人 NANTONG MEMTECH TECHNOLOGIES CO., LTD 发明人 HAN, HUISHENG;ZHANG, HONGMEI;DING, YANG;DONG, ZHIHAO;HUANG, CHENG
分类号 H01H11/04 主分类号 H01H11/04
代理机构 代理人
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