发明名称 EXHAUST TREATMENT DEVICE, SUBSTRATE TREATMENT SYSTEM, AND METHOD FOR TREATING EXHAUST
摘要 This exhaust treatment device treats pollutant gas discharged from a chamber of a cleaning device for cleaning a body to be treated. This exhaust treatment device is provided with: multiple exhaust treatment units which subject the pollutant gas to mutually different treatments; a control unit which, in accordance with recipes specifying a cleaning treatment in the chamber, selects one or more of the multiple exhaust treatment units and controls the exhaust treatment devices such that the pollutant gas is treated only by the selected one or more exhaust treatment units; and a gas line which circulates into the chamber the gas outputted through the selected one or more exhaust treatment units.
申请公布号 WO2016043053(A1) 申请公布日期 2016.03.24
申请号 WO2015JP74953 申请日期 2015.09.02
申请人 TOKYO ELECTRON LIMITED 发明人 MORIYA TSUYOSHI;KOBAYASHI SENSHO
分类号 B01D53/68;B01D53/44;B01D53/58 主分类号 B01D53/68
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