发明名称 Semiconductor Device and Method
摘要 A vertical gate all around (VGAA) is provided. In embodiments, the VGAA has a nanowire with a first contact pad and a second contact pad. A gate electrode is utilized to help define a channel region within the nanowire. In additional embodiments multiple nanowires, multiple bottom contacts, multiple top contacts, and multiple gate contacts are utilized.
申请公布号 US2016087059(A1) 申请公布日期 2016.03.24
申请号 US201414490574 申请日期 2014.09.18
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Hsieh Ming-Ta;Ohtou Tetsu;Tsai Ching-Wei;Wang Chih-Hao
分类号 H01L29/423;H01L29/417;H01L29/06;H01L29/10;H01L21/8234;H01L27/088 主分类号 H01L29/423
代理机构 代理人
主权项 1. A semiconductor device comprising: a first nanowire over a substrate, the first nanowire being perpendicular to the substrate and comprising a first source/drain region, a channel region over the first source/drain region, and a second source/drain region over the channel region; a first contact pad at least partially surrounding the first source/drain region; a gate electrode at least partially surrounding the channel region; and a second contact pad in electrical connection with the second source/drain region.
地址 Hsin-Chu TW