发明名称 |
Semiconductor Device and Method |
摘要 |
A vertical gate all around (VGAA) is provided. In embodiments, the VGAA has a nanowire with a first contact pad and a second contact pad. A gate electrode is utilized to help define a channel region within the nanowire. In additional embodiments multiple nanowires, multiple bottom contacts, multiple top contacts, and multiple gate contacts are utilized. |
申请公布号 |
US2016087059(A1) |
申请公布日期 |
2016.03.24 |
申请号 |
US201414490574 |
申请日期 |
2014.09.18 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Hsieh Ming-Ta;Ohtou Tetsu;Tsai Ching-Wei;Wang Chih-Hao |
分类号 |
H01L29/423;H01L29/417;H01L29/06;H01L29/10;H01L21/8234;H01L27/088 |
主分类号 |
H01L29/423 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device comprising:
a first nanowire over a substrate, the first nanowire being perpendicular to the substrate and comprising a first source/drain region, a channel region over the first source/drain region, and a second source/drain region over the channel region; a first contact pad at least partially surrounding the first source/drain region; a gate electrode at least partially surrounding the channel region; and a second contact pad in electrical connection with the second source/drain region. |
地址 |
Hsin-Chu TW |