| 摘要 |
The present invention is a radiation-sensitive resin composition containing a compound which has a polymer having a structural unit including an acid-dissociable group, a radiation-sensitive acid generator, and an amine structure, wherein the amine structure changes to an amide structure, a thioamide structure, a nitrile structure, or an ammonium structure by exposure to radiation. The compound may be expressed by formula (1). In formula (1), R1 and R6 are hydrogen atoms, halogen atoms, cyano groups, hydroxyl groups, univalent hydrocarbon groups, or univalent heterocycle groups. R2 to R5 are hydrogen atoms, halogen atoms, univalent hydrocarbon groups, univalent heterocycle groups, or represent a ring structure in which one or more groups selected from R2 and R3, R3 and R4, and R4 and R5 are joined with each other and configured along with carbon atoms to which the groups are bonded. X is an oxygen atom, a sulfur atom, -CRARB-, or -NRC-. RA, RB, and RC are hydrogen atoms, halogen atoms, or univalent organic groups. |
