发明名称 METHOD OF REGENERATING POLISHING SLURRY AND METHOD OF MANUFACTURING SUBSTRATE
摘要 Provided is a method to regenerate polishing slurry, which prevents the concentrate of polishing scraps from mixing with polishing slurry and easily improves the manufacturing efficiency and yield rate of a substrate. The method to regenerate polishing slurry comprises a regeneration process of regenerating polishing slurry mixed with the ingredients of a small board by polishing the surface of the small board. The small board contains at least aluminum oxide and alkaline earth metal oxide. The regeneration process comprises: adding acid to the polishing slurry mixed with the aluminum oxide and the alkaline earth metal oxide from the small board by polishing the surface of the small board; and removing the aluminum oxide and the alkaline earth metal oxide from the polishing slurry, thereby regenerating the polishing slurry.
申请公布号 KR20160032680(A) 申请公布日期 2016.03.24
申请号 KR20150128321 申请日期 2015.09.10
申请人 ASAHI GLASS COMPANY LTD. 发明人 SETO YOUSUKE;ITO MASABUMI
分类号 B24B57/00;B24B57/02 主分类号 B24B57/00
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