| 摘要 |
A deflecting field assembly for generating a deflecting field for deflecting secondary electrons emitted from a sample irradiated by a Focused Ion Beam (FIB), the FIB emanating from a FIB column and traveling along a beam axis within a beam region, which field extends from the deflecting field assembly; the deflecting field being configured to deflect a trajectory of the secondary electrons, which were propagating towards the FIB column, to propel away from the beam axis, the deflecting field being configured to divert the secondary electrons while they are generally within the beam region. An electron detection system for detecting secondary electrons comprises an electron detector positioned at a lateral distance away from the FIB column; and the deflecting field assembly, configured to deflect the secondary electrons towards the electron detector. A FIB system comprises an FIB column and the deflecting field assembly or the electron detection system. |
