| 发明名称 |
Method for polishing silicon nitride and polycrystalline silicon |
| 摘要 |
A polishing composition used in an application to polish silicon nitride is characterized by containing colloidal silica in which an organic acid, such as a sulfonic acid or a carboxylic acid, is immobilized, and having a pH of 6 or less. |
| 申请公布号 |
EP2610031(B1) |
申请公布日期 |
2016.03.23 |
| 申请号 |
EP20110819793 |
申请日期 |
2011.08.10 |
| 申请人 |
FUJIMI INCORPORATED |
发明人 |
MIZUNO, TAKAHIRO;YOKOTA, SHUUGO;YAMATO, YASUYUKI;AKATSUKA, TOMOHIKO |
| 分类号 |
B24B37/00;C09C1/30;C09G1/02;C09K3/14;H01L21/3105 |
主分类号 |
B24B37/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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