发明名称 FLOW PATH MEMBER, AND HEAT EXCHANGER AND SEMICONDUCTOR MANUFACTURING DEVICE USING SAME
摘要 [Object] To provide a flow path member, and a heat exchanger and a semiconductor manufacturing device using the flow path member, which are highly reliable. [Solution] There is provided a flow path member including: a first wall section 1; a second wall section 2; and a third wall section 3 that is provided between the first wall section 1 and the second wall section 2. An internal section that is configured by the first wall section 1, the second wall section 2, and the third wall section 3 becomes a flow path through which a fluid flows and a plurality of flow path openings 4 of the flow path are arranged in one direction on a cut plane obtained by cutting from the first wall section 1 to the second wall section 2. Since one of two adjacent flow path openings 4 is disposed to be more displaced than the other either toward the first wall section 1 side or toward the second wall section 2 side, it is possible to reduce stress concentration between corners of adjacent flow path openings, it is difficult to damage the flow path, and it is possible to achieve a flow path member 10 of which reliability is improved.
申请公布号 EP2879162(A4) 申请公布日期 2016.03.23
申请号 EP20130822788 申请日期 2013.07.29
申请人 KYOCERA CORPORATION 发明人 SEKIGUCHI,KEIICHI;FUJIO,KAZUHIKO;ISHIMINE,YUUSAKU
分类号 H01L23/473;F28F13/06;H01L21/67 主分类号 H01L23/473
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