发明名称 |
REACTOR FOR PRODUCING POLYCRYSTALLINE SILICON AND METHOD FOR REMOVING A SILICON-CONTAINING LAYER ON A COMPONENT OF SUCH A REACTOR |
摘要 |
Silicon deposited by CVD and/or silico dust is removed from a polycrystalline silicon deposition reactor component by abrasion with silicon-containing particles in a gas stream. |
申请公布号 |
EP2997175(A1) |
申请公布日期 |
2016.03.23 |
申请号 |
EP20140721859 |
申请日期 |
2014.05.06 |
申请人 |
WACKER CHEMIE AG |
发明人 |
WECKESSER, DIRK |
分类号 |
C23C16/442;B24C1/00;C01B33/035;C23C16/24;C23C16/44 |
主分类号 |
C23C16/442 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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