发明名称 |
Interconnection structure including blind via holes intended for being metallised |
摘要 |
The structure (100) has a substrate (102) whose face (110) is integrated to a face (111) of another substrate (104). An electric contact (114) is arranged against the face of the latter substrate and next to a blind via (108) and/or against the face and/or another face (112) of the former substrate. A channel (116) provides communication of the via with an environment outside of the structure and/or with a cavity formed in the structure. The channel extends parallel to one of the faces of the substrates. An independent claim is also included for a method for realization of an interconnection structure. |
申请公布号 |
EP2365743(A3) |
申请公布日期 |
2016.03.23 |
申请号 |
EP20110157130 |
申请日期 |
2011.03.07 |
申请人 |
COMMISSARIAT À L'ÉNERGIE ATOMIQUE ET AUX ÉNERGIESALTERNATIVES |
发明人 |
SAINT-PATRICE, DAMIEN;BOLIS, SÉBASTIEN;JACQUET, FABRICE |
分类号 |
H05K3/40;H01L21/60;H01L21/768;H01L23/00;H01L23/48 |
主分类号 |
H05K3/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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