发明名称 Interconnection structure including blind via holes intended for being metallised
摘要 The structure (100) has a substrate (102) whose face (110) is integrated to a face (111) of another substrate (104). An electric contact (114) is arranged against the face of the latter substrate and next to a blind via (108) and/or against the face and/or another face (112) of the former substrate. A channel (116) provides communication of the via with an environment outside of the structure and/or with a cavity formed in the structure. The channel extends parallel to one of the faces of the substrates. An independent claim is also included for a method for realization of an interconnection structure.
申请公布号 EP2365743(A3) 申请公布日期 2016.03.23
申请号 EP20110157130 申请日期 2011.03.07
申请人 COMMISSARIAT À L'ÉNERGIE ATOMIQUE ET AUX ÉNERGIESALTERNATIVES 发明人 SAINT-PATRICE, DAMIEN;BOLIS, SÉBASTIEN;JACQUET, FABRICE
分类号 H05K3/40;H01L21/60;H01L21/768;H01L23/00;H01L23/48 主分类号 H05K3/40
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