| 摘要 |
PROBLEM TO BE SOLVED: To provide a technology for reducing reflection diffraction ghosts while reducing influences upon optical characteristics of a solid-state imaging apparatus.SOLUTION: The solid-state imaging apparatus includes: a substrate including a photoelectric conversion part; a first microlens for converging light to the photoelectric conversion part; a second microlens that is provided relatively to the first microlens; and a reflection member that is positioned between the substrate and the second microlens. The second microlens and the reflection member are configured in such a manner that, a first partial light, in a light of a specific wavelength range with which the solid-state imaging apparatus is irradiated, that is transmitted through the first microlens, reflected by the substrate and transmitted through the first microlens again is weakened by a second partial light, in the light of the specific wavelength range, that is transmitted through the second microlens, reflected by the reflection member and transmitted through the second microlens again.SELECTED DRAWING: Figure 4 |
