发明名称 INFRARED REFLECTION SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide an infrared reflection substrate having a low reflectance for visible light, excellent visibility and excellent productivity.SOLUTION: An infrared reflection substrate 101 includes an infrared reflection layer 23 essentially comprising silver, a light-absorbing metal layer 25, and a transparent protective layer 30, in this order on a transparent film substrate 10. The light-absorbing metal layer 25 has a film thickness of 15 nm or less, and the transparent protective layer 30 has a film thickness of 10 nm to 120 nm. The distance between the light-absorbing metal layer 25 and the transparent protective layer 30 is 25 nm or less.SELECTED DRAWING: Figure 1
申请公布号 JP2016038420(A) 申请公布日期 2016.03.22
申请号 JP20140159889 申请日期 2014.08.05
申请人 NITTO DENKO CORP 发明人 NAKANISHI YOSUKE;WATANABE MASAHIKO;OMORI YUTAKA
分类号 G02B5/26;B32B7/02;B32B15/01;G02B5/22 主分类号 G02B5/26
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