发明名称 Lithographic apparatus and lorentz actuator
摘要 A lithographic apparatus includes an actuator for producing a force in a first direction between a first and a second part including a first magnet assembly and a second magnet assembly each attached opposite to each other to the first part of the apparatus, the first magnet assembly including a first main magnet system and a first outer subsidiary magnet system, and the second magnet assembly including a second main magnet system and a second outer subsidiary magnet system, the first and second main magnet system defining a space between them in a second direction perpendicular to the first direction. The actuator includes a coil attached to the second part. The distance between the first outer subsidiary magnet system and the second outer subsidiary magnet system in the second direction is substantially zero.
申请公布号 US9293951(B2) 申请公布日期 2016.03.22
申请号 US201313737848 申请日期 2013.01.09
申请人 ASML NETHERLANDS B.V. 发明人 Boon Fidelus Adrianus;Van Agtmaal Hendrikus Pascal Gerardus Johannes;Kechroud Abdelhamid;Hol Sven Antoin Johan;Heijmans Peter Michel Silvester Maria
分类号 G03B27/58;H02K1/06;G03F7/20 主分类号 G03B27/58
代理机构 Pillsbury Winthrop Shaw Pittman LLP 代理人 Pillsbury Winthrop Shaw Pittman LLP
主权项 1. A lithographic apparatus comprising: an actuator configured to produce a force in a first direction between a first and a second part of the lithographic apparatus, the actuator comprising a first magnet assembly and a second magnet assembly each attached opposite to each other to the first part of the lithographic apparatus, the first magnet assembly comprising a first main magnet system and a first outer subsidiary magnet system, and the second magnet assembly comprising a second main magnet system and a second outer subsidiary magnet system, the first and second main magnet system defining a space between them in a second direction substantially perpendicular to the first direction, wherein the first and second magnet assembly are arranged in Halbach configuration to provide a magnetic field of which at least a part is directed in the second direction, an electrically conductive element attached to the second part of the lithographic apparatus and arranged at least partially in the space between the first and second main magnet system, so as to produce the force by interaction of an electric current carried by the electrically conductive element and the magnetic field, wherein the distance between the first outer subsidiary magnet system and the second outer subsidiary magnet system in the second direction is substantially zero.
地址 Veldhoven NL