发明名称 Shock resistant bearing for a timepiece
摘要 Shock resistant bearing for a timepiece including an elastic structure and a central portion carried by the elastic structure, the central portion having a blind hole intended to receive a pivot of a rotating wheel set of the timepiece. The elastic structure and the central portion are formed by a single-piece part formed of single crystal quartz and the blind hole has at least partially the shape of a truncated or non-truncated trigonal pyramid against which the end of the pivot abuts. The invention also concerns a method of manufacturing a shock resistant bearing of this type wherein the single-piece wafer is machined in an anisotropic etching bath for single crystal quartz. Preferably, two masks are respectively arranged on the two sides of the wafer to simultaneously etch the quartz from both sides.
申请公布号 US9292005(B2) 申请公布日期 2016.03.22
申请号 US201214364550 申请日期 2012.12.07
申请人 The Swatch Group Research and Development Ltd 发明人 Hessler Thierry
分类号 G04B31/004;G04B31/02;G04B31/06 主分类号 G04B31/004
代理机构 Oblon, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A method for manufacturing a shock resistant bearing including an elastic structure and a central portion carried by said elastic structure, said central portion having a blind hole intended to receive a pivot of a rotating wheel set of the timepiece, the elastic structure and the central portion being formed by one single-piece part, said method comprising: A) making a single crystal quartz wafer whose two main faces, respectively the first and second faces, are substantially oriented perpendicularly to the optical axis of the crystalline structure of the single crystal quartz; B) forming a first mask on the first face of the single crystal quartz wafer, said first mask being structured by photolithography so as to define on the first face the contours of said elastic structure and of said blind hole; C) machining said elastic structure and said blind hole in said single crystal quartz wafer by placing said wafer in a chemical etching bath adapted for an anisotropic etch of single crystal quartz which greatly facilitates an etch along said optical axis, said first mask being selected to resist the etch of said chemical etching bath.
地址 Marin CH